Nanolithography and Surface Microscopy with Electron Beams

Nanolithography and Surface Microscopy with Electron Beams, Volume 231 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. Specific chapters cover Introduction to inverse problems in electron microscopy, Directional sinogram inpainting for limited angle tomography, Strain tomography of crystals, FISTA with adaptive discretization, Total variation discretization, and Reconstruction with a Gaussian Dictionary. Provides the authority and expertise of leading contributors from an international board of authorsPresents the latest release in the Advances in Imaging and Electron Physics series INDICE: Introduction and SummaryLord Broers1. Early lifeLord Broers2. Modification of an SEM/Ion beam system to improve the resolution and reliability of the SEM and remove oxygen ions from the ion beamLord Broers3. Formation of cones and ridges on ion-etched surfacesLord Broers4. Microfabrication in an SEMLord Broers5. High Resolution Short Focal Length Lens Electron ProbeLord Broers6. Low-Loss Surface Microscopy in short focal length ProbeLord Broers7. Microfabrication in the 5Å electron probeLord Broers8. Nanodevices fabricated in the HR ProbeLord Broers9. Fabrication of Structures with Dimensions Below 10 nmLord Broers10. Semiconductor Lithography and ProcessingLord Broers11. Nanolithography at 400kVLord Broers12. Last twenty years and future of semiconductor chipsLord Broers

• ISBN: 978-0-443-31462-9
• Editorial: Academic Press
• Encuadernacion: Cartoné
• Páginas: 232
• Fecha Publicación: 01/08/2024
• Nº Volúmenes: 1
• Idioma: