Nanolithography: The Art of Fabricating Nanoelectronic and Nanophotonic Devices and Systems

Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing - some components are now just a few dozen atoms wide. This book attempts to answer the questions, What comes next?? and How do we get there??Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics.This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensionsCovers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithographyDescribes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics INDICE: Contributor contact details Woodhead Publishing Series in Electronic and Optical Materials Preface 1: Optical projection lithographyAbstract1.1 Introduction1.2 Lithography technology and trends1.3 Fundamentals of optical lithography1.4 Image evaluation1.5 Projection lithography systems1.6 Wavelengths for optical lithography1.7 Lithography in the deep ultraviolet (UV)1.8 Resolution enhancement technology1.9 Immersion lithography1.10 Multiple patterning optical lithography1.11 Conclusion 2: Extreme ultraviolet (EUV) lithographyAbstract2.1 Introduction2.2 EUV sources2.3 EUV optics2.4 EUV masks2.5 EUV resists2.6 EUV integration and implementation challenges2.7 Conclusion and future trends2.8 Acknowledgments 3: Electron beam lithographyAbstract3.1 Introduction3.2 Using pixel parallelism to address the throughput bottleneck3.3 The tradeoff between resolution and throughput3.4 Distributed systems3.5 Ultimate lithographic resolution3.6 Electron-beam patterning of photomasks for optical lithography3.7 Conclusion3.8 Acknowledgements 4: Focused ion beams for nano-machining and imagingAbstract4.1 Introduction4.2 An adumbrated history of focused ion beams (FIBs)4.3 Sources of ions: a quartet of types4.4 Charged particle optics4.5 Ion-matter interactions4.6 Milling4.7 Deposition4.8 Imaging4.9 Spectroscopy4.10 Conclusion and future trends 5: Masks for micro- and nanolithographyAbstract5.1 Introduction5.2 Mask materials5.3 Mask process5.4 Mask metrology5.5 Defects and masks5.6 Conclusion 6: Maskless photolithographyAbstract6.1 Introduction6.2 The use of photons as opposed to charged particles6.3 Forms of maskless photolithography6.4 Zone-plate-array lithography (ZPAL)6.5 Proximity-effect correction6.6 Extending the resolution of ZPAL6.7 Commercialization of ZPAL by LumArray, Inc.6.8 Conclusion 7: Chemistry and processing of resists for nanolithographyAbstract7.1 Introduction7.2 Resists for optical lithography: synthesis and radiation induced chemistry of resists as a function of exposure technology7.3 Chemically amplified resist process considerations7.4 Chemically amplified resists for 193 nm lithography7.5 Resists for extreme ultraviolet lithography (EUVL)7.6 Resists for electron beam lithography7.7 Resists for selected forward looking lithographic technologies7.8 Resist resolution limitations7.9 Conclusion 8: Directed assembly nanolithographyAbstract8.1 Introduction8.2 Block copolymers in lithography8.3 Directed self-assembly of block copolymers8.4 Programmable three-dimensional lithography8.5 Conclusion 9: Nanoimprint lithographyAbstract9.1 Introduction9.2 An overview of imprint lithography9.3 Soft lithography9.4 Thermal imprint lithography9.5 Alternative thermal imprint processes9.6 Ultraviolet (UV) nanoimprint lithography overview9.7 Jet and flash imprint lithography9.8 Roll to roll imprint lithography9.9 Defectivity9.10 Conclusions9.11 Acknowledgments 10: Nanostructures: fabrication and applicationsAbstract10.1 Introduction10.2 Characterization of nanostructures10.3 Methods to create nanostructures: top-down fabrication of nanostructures10.4 Methods to create nanostructures: bottom-up fabrication of nanostructures10.5 Properties of nanostructures10.6 Applications of nanostructures 11: Nanophotonics: devices for manipulating light at the nanoscaleAbstract11.1 Introduction11.2 Photonic crystals11.3 Ring resonators11.4 Extraordinary optical transmission through subwavelength apertures11.5 Optical nanoantennas11.6 Plasmonic focusing11.7 Near-field optical microscopy11.8 Plasmonic waveguides11.9 Enhancement of nonlinear processes11.10 Application in photovoltaics11.11 Conclusion 12: Nanodevices: fabrication, prospects for low dimensional devices and applicationsAbstract12.1 Introduction12.2 Motivation for nanodevices12.3 Nanofabrication: creating the building blocks for devices12.4 Prospects for low dimensional devices12.5 Beyond the bottom-up: hybrid nanoelectronics12.6 Conclusion and future trends 13: Microfluidics: technologies and applicationsAbstract13.1 Introduction13.2 Current trends in microfluidics13.3 Present state of technology13.4 Applications13.5 Future trends13.6 Conclusion13.7 Sources of further information and advice 14: Modeling of nanolithography processesAbstract14.1 Introduction14.2 Optical lithography modeling14.3 The optical system in optical lithography modeling14.4 Photoresist model14.5 Model critical dimension (CD) extraction14.6 Difficulties in modeling14.7 Extreme ultraviolet (EUV)/electron beam lithography modeling14.8 Conclusion 15: Mask-substrate alignment via interferometric moiré fringesAbstract15.1 Introduction15.2 Background to alignment methods15.3 Fundamentals of interferometric-spatial-phase imaging (ISPI)15.4 Implementation of moiré15.5 Characteristics of moiré fringe formation15.6 Performance of ISPI15.7 Backside ISPI15.8 Conclusion and future trends 16: Sidewall roughness in nanolithography: origins, metrology and device effectsAbstract16.1 Introduction16.2 Metrology and characterization16.3 Process and material effects: modeling and simulation16.4 Process and material effects: experimental results16.5 Impact on device performance16.6 Conclusions 17: New applications and emerging technologies in nanolithographyAbstract17.1 Introduction17.2 Applications of high-resolution patterning to new device structures: advances in tunneling structures17.3 Geometry control of the tunnel junctions17.4 The quantum dot placement problem17.5 Conclusion17.6 Acknowledgments Index

• ISBN: 978-0-08-101404-2
• Editorial: Woodhead Publishing
• Encuadernacion: Rústica
• Páginas: 592
• Fecha Publicación: 30/06/2016
• Nº Volúmenes: 1
• Idioma: Inglés